Beamline Information » Beamline by Number » BL09A1 


Scanning Photoelectron Microscopy (SPEM)
►Contact Information
If you have any technical concerns, please contact us!
BL09A1 Spokesperson:
Chen, Chia-Hao (, +886-3-578-0281 Ext: 7325)

BL09A1 Beamline Manager:
Kuo, Yen-Chien (, +886-3-578-0281 Ext: 3267)

►Technical Information

Operational (general use)



Microscopy: SPEM


5 cm Period Length, 76 periods undulator

Ring Current (mA)

300 mA

Average Beam Lifetime

Infinite Under NSRRC Top Up Conditions

Energy Range


Calculated Energy Resolution(eV)

0.01@130eV(285 l/mm), 0.03@280eV(400 l/mm), 0.08@640eV(800 l/mm), 0.06@900eV(1600 l/mm)

Calculated Spot Size

FWHM: 0.3 mm (H) x 0.03 mm (V)

Calculated Flux*(photons/s)

4.6E13@130eV(I)(285 l/mm), 1.8E13@280eV(I)(400 l/mm), 4.2E11@640eV(III)(800 l/mm), 9.9E11@900eV(III)(1600 l/mm)


Vertical Focusing Mirror, 6m Spherical Grating Monochromator, Kirkpatrick-Baez Mirrors


4 interchangeable spherical gratings (285 l/mm, 400 l/mm, 800 l/mm, 1600 l/mm),

Beamline Phone Number

886-3-5780281 Ext 1101(A1)

SPEM is an experimental end station which equipped with Fresnel zone plate optics to focus the X-ray beam. The spot size after focus is about 100 nm. The sample is then raster-scanned relative to the focused beam. The core-level photoelectron signal excited by the focused X-ray is collected by a 16-channel hemispherical electron energy analyzer to form 2-D surface elemental mapping.
  • Major instrumentation
    • PHI hemispherical electron energy analyzer
    • LEED
  • Experimental technique
    • Microscopy, μ-XPS
  • Capabilities
    • Energy Rang:

      60 ~ 1400eV

      Spatial Resolution 

      ~ 100 nm

      Sample Requirement:

      Conductor, Semiconductor, UHV compatible

►Station Photos
Schematic diagram of the  major components of SPEM
Image of test pattern for spatial resolution test 
►Extension Links